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Volumn 257, Issue 16, 2011, Pages 7320-7325

Investigation of structure and magnetic properties of the as-deposited and post-annealed iron nitride films by reactive facing-target sputtering

(3) Feng, X P a Mi, W B a Bai, H L a

a TIANJIN UNIVERSITY (China)

Author keywords

Annealing; Iron nitride; Magnetic property; Sputtering; Structure

Indexed keywords

ANNEALING; MAGNETIC PROPERTIES; MAGNETISM; NITRIDES; NITROGEN; SPUTTERING; STRUCTURE (COMPOSITION);

AS-DEPOSITED FILMS; BAND BARRIERS; FACING TARGET SPUTTERING; IRON NITRIDE FILMS; IRON NITRIDES; MAGNETIC CHARACTERISTIC; NITROGEN CONCENTRATIONS; NITROGEN FLOW RATES;

IRON COMPOUNDS;

EID: 79955605433 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.03.112 Document Type: Article

Times cited : (22)

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