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Journal of Applied Physics

Volumn 109, Issue 7, 2011, Pages

Influence of sputtering power on the high frequency properties of nanogranular FeCoHfO thin films

(7) Lu, Guangduo a Zhang, Huaiwu a Xiao, John Q b Bai, Feiming a Tang, Xiaoli a Li, Yuanxun a Zhong, Zhiyong a

a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (China)

b UNIVERSITY OF DELAWARE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COERCIVITIES; COMPOSITION CHANGES; CONTROL PARAMETERS; DEPOSITION PROCESS; ELECTRICAL RESISTIVITY; HIGH-FREQUENCY PROPERTIES; MAXIMUM VALUES; MINIMUM VALUE; NANOGRANULARS; PARTIAL PRESSURE OF OXYGEN; RESONANT FREQUENCIES; RF-MAGNETRON SPUTTERING; SOFT MAGNETICS; SPUTTERING POWER;

ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; OXYGEN; THIN FILMS; VAPOR DEPOSITION;

SATURATION MAGNETIZATION;

EID: 79955461580 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3563063 Document Type: Conference Paper

Times cited : (10)

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