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Volumn 104, Issue 9, 2008, Pages

Tuning of the magnetization dynamics in as-sputtered FeCoSiN thin films by various sputtering gas pressures

Author keywords

[No Author keywords available]

Indexed keywords

DAMPING; DYNAMICS; MAGNETIZATION; MAGNETS; PERTURBATION TECHNIQUES; THICK FILMS; THIN FILMS;

EID: 56349104762     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3006006     Document Type: Article
Times cited : (31)

References (32)
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    • P. Zou, W. Yu, and J. A. Bain, IEEE Trans. Magn. 0018-9464 10.1109/TMAG.2002.802705 38, 3501 (2002).
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    • G. Herzer, IEEE Trans. Magn. 0018-9464 10.1109/20.104389 26, 1397 (1990).
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    • Herzer, G.1
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  • 29
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    • Influence of Si concentration on the magnetization dynamics in as-sputtered FeCoSiN thin films at high frequencies
    • (to be published). 0021-8979
    • F. Xu, X. Chen, Y. G. Ma, N. N. Phuoc, X. Y. Zhang, and C. K. Ong, " Influence of Si concentration on the magnetization dynamics in as-sputtered FeCoSiN thin films at high frequencies.," J. Appl. Phys. (to be published). 0021-8979
    • J. Appl. Phys.
    • Xu, F.1    Chen, X.2    Ma, Y.G.3    Phuoc, N.N.4    Zhang, X.Y.5    Ong, C.K.6
  • 31
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    • 0163-1829 10.1103/PhysRevB.60.7395.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.