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Journal of Applied Physics

Volumn 109, Issue 7, 2011, Pages

Thermodynamics and kinetics of silicon under conditions of strong electronic excitation

(2) Shokeen, Lalit a Schelling, Patrick K a

a UNIVERSITY OF CENTRAL FLORIDA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; DENSITY-FUNCTIONAL THEORY CALCULATIONS; DIAMOND STRUCTURES; ELECTRONIC EXCITATION; ELECTRONIC TEMPERATURE; EMPIRICAL POTENTIALS; GROWING CRYSTALS; HIGH-T; LATTICE INSTABILITY; LATTICE TEMPERATURES; MELTING TEMPERATURES; PHONON SPECTRUM; RATE OF CRYSTALLIZATION; SMOOTH FUNCTIONS; THERMODYNAMICS AND KINETICS;

AMORPHOUS SILICON; TEMPERATURE; THERMODYNAMICS; TIME VARYING SYSTEMS; WAVE FUNCTIONS;

DENSITY FUNCTIONAL THEORY;

EID: 79955400534 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3554410 Document Type: Conference Paper

Times cited : (27)

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