A study on the fabrication and structural properties of Al-Co/AlN-Co thin films

Journal of Korean Institute of Metals and Materials

Volumn 49, Issue 3, 2011, Pages 256-263

  Han, Chang Suk ^a   Han, Seung Oh ^a  

^a Hoseo University   (South Korea)

Author keywords

Magnetic properties; Resistivity; Sputtering; Thin films; X ray diffraction

Indexed keywords

ALN; ANNEALING CONDITION; AS-DEPOSITED FILMS; CO THIN FILMS; COERCIVITIES; DC SPUTTERING; DEPOSITED FILMS; HIGH RESISTIVITY; LAYER THICKNESS; LAYER THICKNESS RATIO; RESISTIVITY; TARGET TYPE;

ALUMINUM; COBALT; COERCIVE FORCE; DIFFRACTION; FILM PREPARATION; MAGNETIZATION; MICROSTRUCTURE; THIN FILMS; X RAY DIFFRACTION;

MULTILAYER FILMS;

EID: 79955365999     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: 10.3365/KJMM.2011.49.3.256     Document Type: Article

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