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Volumn 13, Issue 6, 2007, Pages 463-468

Comparative study on mechanical properties of MoSiN multilayer films deposited on Si(100) and Ti-covered Si(100) substrates

(5) Jung, C K a Jeong, S H a Chung, Y M a Han, J G a Boo, J H a

a Sungkyunkwan University (South Korea)

Author keywords

Hardness; MoSiN films; Residual stress; Ti and Ti Si3N4 interlayer

Indexed keywords

DENSITY (SPECIFIC GRAVITY); FILM PREPARATION; HARDNESS; MAGNETRON SPUTTERING; MULTILAYERS; NITROGEN PLASMA; RESIDUAL STRESSES; SILICON; SILICON COMPOUNDS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

COMPARATIVE STUDIES; FILM COMPOSITION; ION CURRENT DENSITY; MAXIMUM HARDNESS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING METHOD; SI (100) SUBSTRATE; VACUUM CONDITION;

MULTILAYER FILMS;

EID: 38349098634 PISSN: 15989623 EISSN: None Source Type: Journal
DOI: 10.1007/BF03027903 Document Type: Article

Times cited : (1)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.