Activation of ultrathin oxide films for chemical reaction by interface defects

Journal of the American Chemical Society

Volumn 133, Issue 16, 2011, Pages 6142-6145

  Jung, Jaehoon ^a,b   Shin, Hyung Joon ^b,c   Kim, Yousoo ^b   Kawai, Maki ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b RIKEN   (Japan)

^c Ulsan National Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AG(100); BURIED INTERFACE; INTERFACE DEFECTS; METAL SUBSTRATE; MGO FILMS; OXIDE SURFACE; OXIDE-METAL INTERFACE; PERIODIC DENSITY FUNCTIONAL THEORY CALCULATIONS; STRONG ENHANCEMENT; ULTRA-THIN; ULTRA-THIN OXIDE FILMS; WATER DISSOCIATION;

CHEMICAL REACTIONS; DENSITY FUNCTIONAL THEORY; SILVER; SURFACE DEFECTS; ULTRATHIN FILMS;

OXIDE FILMS;

MAGNESIUM; OXIDE; SILVER; WATER;

ARTICLE; CALCULATION; CHEMICAL ANALYSIS; CHEMICAL REACTION; DENSITY FUNCTIONAL THEORY; FILM; ULTRATHIN OXIDE FILM;

EID: 79955030526     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja200854g     Document Type: Article

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