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Volumn 95, Issue 6, 2011, Pages 1518-1526

The spray-ILGAR® (ion layer gas reaction) method for the deposition of thin semiconductor layers: Process and applications for thin film solar cells

Author keywords

Buffer layer; Chalcopyrite thin film solar cell; ILGAR; In line process; In2S3

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOUR DEPOSITIONS; BI-LAYER; BUFFER MATERIALS; CDS; CHALCOPYRITE SOLAR CELLS; CHALCOPYRITE THIN FILMS; CHEMICAL MECHANISM; CHEMICAL-BATH DEPOSITION; CONTROLLED DEPOSITION; CU(IN , GA)SE; CU(IN ,GA)(S ,SE)2; HEATED SUBSTRATES; HELMHOLTZ; ILGAR; IN-LINE; IN-PROCESS; IN2S3; ION LAYER GAS REACTION; LAYER THICKNESS; LINEAR PRODUCTION; MATERIAL PROPERTY; NANODOTS; NEBULISATION; PILOT PRODUCTION; PRECURSOR SOLUTIONS; PROCESS ACCELERATION; ROLL TO ROLL; RUNNING-IN; STEEL TAPE; THIN FILM SOLAR CELLS; THIN SEMICONDUCTOR; UPSCALING; VACUUM-FREE;

EID: 79955020043     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.12.019     Document Type: Article
Times cited : (38)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.