Thermally activated processes at the Co/ZnO interface elucidated using high energy X-rays

Journal of Physical Chemistry C

Volumn 115, Issue 15, 2011, Pages 7411-7418

  Dumont, Jacques A ^a   Mugumaoderha, Mac C ^a   Ghijsen, Jacques ^a   Thiess, Sebastian ^b   Drube, Wolfgang ^b   Walz, Bente ^b   Tolkiehn, Martin ^b   Novikov, Dmitri ^b   De Groot, Frank M F ^c   Sporken, Robert ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

^b DESY   (Germany)

^c UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; CO CLUSTERS; HIGH ENERGY X-RAYS; INTERFACIAL REACTIONS; NANOMETER-SIZED CLUSTERS; ROCK SALT; ROOM TEMPERATURE; SUBSURFACE SITES; THERMALLY ACTIVATED PROCESS; X-RAY PHOTOELECTRONS; X-RAY STANDING WAVE METHOD; ZNO; ZNO SINGLE CRYSTALS;

ABSORPTION SPECTROSCOPY; ANNEALING; COBALT COMPOUNDS; HIGH ENERGY PHYSICS; MONOLAYERS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; SINGLE CRYSTALS; X RAYS; ZINC; ZINC OXIDE;

COBALT;

EID: 79954588338     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp108744c     Document Type: Article

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