Processing parameters and property of AZO thin film prepared by magnetron sputtering

Journal of Physics: Conference Series

Volumn 276, Issue 1, 2011, Pages

  Kong, Hui ^a,b   Yang, Pingxiong ^a   Chu, Junhao ^a  

^a EAST CHINA NORMAL UNIVERSITY   (China)

^b Shanghai Topsolar Green Energy Co Ltd   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CONDUCTIVE FILMS; FILM PREPARATION; FLAT PANEL DISPLAYS; LIGHT; LIGHT EMITTING DIODES; MAGNETRON SPUTTERING; ORGANIC LIGHT EMITTING DIODES (OLED); SPUTTERING; SUBSTRATES;

GLASS SUBSTRATES; MAGNETRON SPUTTERING METHOD; MATERIAL AVAILABILITY; PROCESSING PARAMETERS; PROCESSING PRESSURE; SPUTTERING POWER; TRANSPARENT ELECTRODE; VISIBLE LIGHT TRANSMITTANCES;

THIN FILMS;

EID: 79953842385     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/276/1/012170     Document Type: Conference Paper

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