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Journal of Materials Science

Volumn 46, Issue 12, 2011, Pages 4397-4406

Changes in dewetting behavior of SiO2 films on TiO2 substrates due to film thickness and crucible choice

(2) Riesterer, Jessica L a,b Barry Carter, C a

a UNIVERSITY OF CONNECTICUT (United States)

b IDAHO NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; DE-WETTING; IDEAL MODEL; MARANGONI CONVECTION; MATERIALS SYSTEMS; NANO SCALE; PATTERN FORMATION; PHOTOCATALYTIC PROPERTY; RAYLEIGH INSTABILITY; RUTILE TIO; SURFACE PATTERN; TIO;

CRUCIBLES; GLASS; OXIDE MINERALS; PLATINUM; SILICON COMPOUNDS; SINTERING;

BEHAVIORAL RESEARCH;

EID: 79953796694 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-011-5353-7 Document Type: Conference Paper

Times cited : (4)

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