Formation of boron-based films and boron nitride layers by CVD of a boron ester

Angewandte Chemie - International Edition

Volumn 50, Issue 16, 2011, Pages 3701-3705

  Sachdev, Hermann ^a,b   Müller, Frank ^a   Hüfner, Stefan ^a  

^a SAARLAND UNIVERSITY   (Germany)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

Boron; Chemical vapor deposition; Monolayers; Nitrides; Surface analysis

Indexed keywords

CHEMICAL VAPOR; MULTI-LAYERED; NEW APPROACHES; NITRIDE LAYERS; PRECURSOR DECOMPOSITION;

BORIDES; BORON; CHEMICAL ANALYSIS; ELECTRON ENERGY LEVELS; ESTERS; MONOLAYERS; NITRIDES; RHODIUM; SURFACE ANALYSIS;

CHEMICAL VAPOR DEPOSITION;

EID: 79953710026     PISSN: 14337851     EISSN: 15213773     Source Type: Journal    
DOI: 10.1002/anie.201003012     Document Type: Article

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