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Thin Solid Films

Volumn 519, Issue 12, 2011, Pages 4074-4077

Simultaneous carbon and tungsten thin film deposition using two thermionic vacuum arcs

(7) Marcu, A a Ticos C M a Grigoriu, C a Jepu, I a Porosnicu, C a Lungu, A M a Lungu, C P a

a NATIONAL INSTITUTE FOR LASER (Romania)

Author keywords

Coatings; Thermionic vacuum arc

Indexed keywords

ARC PARAMETERS; ATOMIC CONCENTRATION; CARBON ANODES; CARBON DEPOSITION; DIFFERENT SUBSTRATES; DISCHARGE PARAMETERS; SIMULTANEOUS DEPOSITION; THERMIONIC VACUUM ARC; THERMIONIC VACUUM ARC METHODS; TUNGSTEN FILMS; TUNGSTEN THIN FILMS;

COATINGS; DEPOSITION; ELECTRIC DISCHARGES; SUBSTRATES; TUNGSTEN; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY;

CARBON FILMS;

EID: 79953695927 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.192 Document Type: Article

Times cited : (22)

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