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Volumn , Issue , 2006, Pages 100-101
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Silicon-on-silicon (Sos): A new cmos compatible low-temperature mems process using plasma activated fusion bonding
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ACTUATORS;
ASPECT RATIO;
BONDING;
CMOS INTEGRATED CIRCUITS;
DIELECTRIC DEVICES;
DIELECTRIC MATERIALS;
LOW-K DIELECTRIC;
MICROSYSTEMS;
SILICA;
SILICON ON INSULATOR TECHNOLOGY;
SILICON OXIDES;
SOLID-STATE SENSORS;
SYSTEMS ENGINEERING;
TEMPERATURE;
WAFER BONDING;
DIELECTRIC BARRIER DISCHARGES;
INSULATION LAYERS;
LOW TEMPERATURE WAFER BONDING;
LOW TEMPERATURES;
SILICON DIOXIDE LAYERS;
SILICON-ON-GLASS;
SILICON-ON-INSULATOR PROCESS;
SILICON-ON-SILICON;
SILICON WAFERS;
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EID: 79953655404
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (5)
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