Using deep RIE for micromachining SOI wafers

Proceedings - Electronic Components and Technology Conference

Volumn , Issue , 2002, Pages 1163-1166

  Belov, Nickolai ^a   Khe, Nguyen ^a  

^a IC Sensors Subsidiary of Measurement Specialties Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; REACTIVE ION ETCHING; SILICON SENSORS; SILICON WAFERS;

MASKING MATERIALS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0036290895     PISSN: 05695503     EISSN: None     Source Type: Journal    
DOI: 10.1109/ECTC.2002.1008252     Document Type: Article

References (0)