Micro-structuring of thick NdFeB films using high-power plasma etching for magnetic MEMS application

Journal of Micromechanics and Microengineering

Volumn 21, Issue 4, 2011, Pages

  Jiang, Yonggang ^a   Masaoka, Shingo ^b   Uehara, Minoru ^c   Fujita, Takayuki ^a,b   Higuchi, Kohei ^a   Maenaka, Kazusuke ^a,b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

^c HITACHI CABLE LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING RATE; GAS COMPOSITIONS; HALL-EFFECT SENSORS; HIGH-POWER; INDUCTIVELY COUPLED PLASMA POWER; MAGNETIC FIELD DISTRIBUTION; MAGNETIC MEMS; MAGNETIC MICROSTRUCTURES; MAXIMUM SELECTIVITY; MICRO PATTERNING; MICRO STRUCTURING; NDFEB FILM; PATTERNED MICROSTRUCTURES; RF BIAS; SU-8 PHOTORESIST; VIBRATING SAMPLE MAGNETOMETER;

HALL EFFECT; INDUCTIVELY COUPLED PLASMA; MAGNETIC DEVICES; MAGNETIC FIELD EFFECTS; MAGNETIC FILMS; MAGNETIC PROPERTIES; MAGNETISM; METALLIC FILMS; MICROSTRUCTURE; NEODYMIUM ALLOYS; PHOTORESISTS; PLASMA ETCHING;

MAGNETIC THICK FILMS;

EID: 79953645787     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/4/045011     Document Type: Article

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