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Volumn 12, Issue 6, 2011, Pages 955-960

Room-temperature solution-processed high-k gate dielectrics for large area electronics applications

Author keywords

Anodization; High k gate dielectric; Low temperature circuit; Organic circuit

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ANODIC OXIDATION; CAPACITANCE; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; FLEXIBLE ELECTRONICS; GALLIUM COMPOUNDS; HIGH-K DIELECTRIC; INDIUM COMPOUNDS; OSCILLATORS (ELECTRONIC); SUBSTRATES; TEMPERATURE; THIN FILM CIRCUITS; THIN FILM TRANSISTORS; ZINC COMPOUNDS;

EID: 79953292780     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2011.03.014     Document Type: Article
Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.