Formation of ZnO thin films consisting of nano-prisms and nano-rods with a high aspect ratio by a hydrothermal technique at 60 °c

Current Applied Physics

Volumn 11, Issue 1 SUPPL., 2011, Pages

  Kwon, Ye Bin ^a   Shin, Seung Wook ^b   Lee, Hyun Ki ^a   Lee, Jeong Yong ^b   Moon, Jong Ha ^a   Kim, Jin Hyeok ^a  

^a Chonnam National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Hydrothermal technique; Low growth temperature; Nano structure; ZnO thin film

Indexed keywords

AQUEOUS SOLUTIONS; BAND EDGE; DEFECT-RELATED EMISSION; DEPOSITED FILMS; GLASS SUBSTRATES; HEXAGONAL PHASE; HIGH ASPECT RATIO; HYDROTHERMAL TECHNIQUES; LOW GROWTH TEMPERATURE; OPTICAL AND ELECTRICAL PROPERTIES; OUT-OF-PLANE ORIENTATION; POLYCRYSTALLINE WURTZITE; SECOND PHASE; SURFACE-MODIFYING; ZNO; ZNO THIN FILM;

ALUMINUM; ASPECT RATIO; CHEMICALS; ELECTRIC PROPERTIES; FILM GROWTH; GROWTH TEMPERATURE; HYDROTHERMAL SYNTHESIS; METALLIC FILMS; MORPHOLOGY; NANORODS; OPTICAL FILMS; PRISMS; SODIUM; SUBSTRATES; SURFACE ACTIVE AGENTS; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

SURFACE MORPHOLOGY;

EID: 79953232319     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.086     Document Type: Conference Paper

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