Optoelectronic properties of sputter-deposited Ag-SiO2 nanoparticle films by rapid thermal annealing

Current Applied Physics

Volumn 11, Issue 1 SUPPL., 2011, Pages

  Hsieh, J H ^a   Li, Chuan ^b   Wu, Y Y ^b   Jang, S C ^b  

^a MING CHI UNIVERSITY OF TECHNOLOGY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Ag SiO2 thin films; Nanocomposites; Optical absorbance; Surface plasmon

Indexed keywords

ABSORBANCES; AG FILMS; AG PARTICLES; AG/SIO2 THIN FILMS; ANNEALING TIME; CONDUCTION BAND ELECTRONS; ELEVATED TEMPERATURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; LOCAL RESONANCE; MIE SOLUTIONS; NANO-SIZE; NANOPARTICLE FILMS; OPTICAL ABSORBANCE; OPTICAL ABSORPTION; OPTICAL FIELD; OPTOELECTRONIC PROPERTIES; SILICON DIOXIDE; SILVER PARTICLES; SURFACE PLASMON; SURFACE PROFILERS; UV-VIS-NIR SPECTROPHOTOMETERS; VISIBLE-LIGHT IRRADIATION;

ABSORPTION; ELECTRON MOBILITY; NANOCOMPOSITE FILMS; NANOCOMPOSITES; OPTICAL FILMS; OPTICAL PROPERTIES; PLASMONS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON OXIDES; SURFACE MORPHOLOGY; SURFACE PLASMON RESONANCE; THIN FILMS;

SILVER;

EID: 79953213273     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.015     Document Type: Conference Paper

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