Influence of the deposition conditions on the optical absorption of Ag-SiO2 nanocermet thin films

Thin Solid Films

Volumn 517, Issue 20, 2009, Pages 5848-5854

  Sella, C ^a   Chenot, S ^a   Reillon, V ^a   Berthier, S ^b  

^a SORBONNE UNIVERSITÉ   (France)

^b CNRS   (France)

Author keywords

Co sputtering; Glass metal composites; Nano particles; Silver

Indexed keywords

ABSORPTION PEAKS; CERMET FILMS; CLUSTER MORPHOLOGY; CO-SPUTTERING; COMPOSITE TARGET; DEPOSITION CONDITIONS; FABRICATION PROCESS; GLASS-METAL COMPOSITES; HALF-BAND; KEY FACTORS; MAXWELL-GARNETT THEORY; METAL NANOPARTICLES; MORPHOLOGICAL PARAMETERS; MULTI-LAYERED FILMS; MULTILAYER DEPOSITIONS; NANOCERMET; NUCLEATION AND GROWTH; OPTICAL ABSORPTION; PLASMA RESONANCE; ROTATING SUBSTRATES; SILVER PARTICLES; SUBSTRATE TEMPERATURE; SURFACE PLASMONS; TRANSMISSION ELECTRON;

ABSORPTION; ATOMIC FORCE MICROSCOPY; CERMETS; COMPOSITE FILMS; FILM PREPARATION; GARNETS; GLASS; INTEGRATED OPTOELECTRONICS; LIGHT ABSORPTION; NANOFLUIDICS; NANOPARTICLES; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILVER; SUBSTRATES; SURFACE PLASMON RESONANCE; TRANSMISSION ELECTRON MICROSCOPY;

OPTICAL FILMS;

EID: 67149096310     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.060     Document Type: Article

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