Effect of UV exposure on some optical properties of As-Se based chalcogenide glasses

Integrated Ferroelectrics

Volumn 119, Issue 1, 2010, Pages 22-32

  Chauhan, Rashmi ^a   Srivastava, Amit Kumar ^b   Mishra, Madhu ^c   Srivastava, K K ^c  

^a D A V COLLEGE   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c Dayanand Brajendra Swarup College   (India)

Author keywords

As Se; Chalcogenide glass; optical properties; photodarkening; photorefraction; UV exposure

Indexed keywords

AS-SE; CHALCOGENIDE GLASS; PHOTODARKENING; PHOTOREFRACTION; UV EXPOSURE;

AMORPHOUS FILMS; CERAMIC MATERIALS; ENERGY GAP; FILM PREPARATION; GLASS; LIGHT REFRACTION; OPTICAL BAND GAPS; PHASE CHANGE MEMORY; REFRACTIVE INDEX; REFRACTOMETERS; THERMAL EVAPORATION; THIN FILMS;

SEMICONDUCTING SELENIUM COMPOUNDS;

EID: 79952840691     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584587.2010.489496     Document Type: Conference Paper

References (20)

1. R. Chauhan, P. Dwivedi, and K. K. Srivastava, Se-Te-Pb thin films for Photonic Applications. Proceedings of the DAE Solid State Physics Symposium, BARC, Mumbai, India 53, 727-728 (2008).
2. Zakery and S. R. Elliot, Optical properties and applications of chalcogenide glasses: A Review. J. Non-Cryst. Solids 330, 1-12 (2003).
3. V. G. Ta'eed, N. J. Baker, L. Fu, F. Klaus, R. E. L. Michael, J. M. David, C. N. Hong, J. E. Benjamin, Y. C. Duk, M. Steven, and L. D. Barry, Ultrafast all-optical chalcogenide glass photonic circuits. Opt. Express. 15(15), 9205-9221 (2007). (Pubitemid 47171688)
4. 3 fibers obtained using a 0/-1 phase mask. Opt. Mater. 31(6), 942-944 (2009).
5. J. Hu and C. R. Menyuk, Optimization of the operational bandwidth in air-core photonic bandgap fibers for IR transmission. Opt. Commun. 282, 18-21 (2009).
6. R. Swanepoel, Determination of thickness and optical constants of amorphous silicon. J. Phys. E: Sci. Instrum. 16, 1214-1222 (1983). (Pubitemid 14506815)
7. 3 by 633 nm illumination. Opt. Express. 10(15), 639-644 (2002).
8. 60 thin films from transmittance and reflectance measurements. J. Appl. Sci. 6(2), 340-346 (2006). (Pubitemid 43399703)
9. 3 semiconducting glass films of non-uniform thickness from transmission measurements. Mat. Sci. Eng. B-Solid. 25, 53-59 (1994).
10. 3 thin films. Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics and Imaging SPIE TD01, 126-128 (2002).
11. 3 amorphous films and their applications in micro-optics technology. J. Phys. Chem. Solids 68, 931-935 (2007). (Pubitemid 46915423)
12. M. Manevich, M. Klebanov, V. Lyubin, J. Varshal, J. Border, and N. P. Eisenberg, Gap Microlithography for chalcogenide micro-lens array fabrication. Chalc. Lett. 5(4), 61-64 (2008).
13. 3 thin amorphous films. Mater. Lett. 36, 294-298 (1998). (Pubitemid 128414414)
14. 3 under in situ laser irradiation. J. Non-Cryst. Solids 352, 595-600 (2006). (Pubitemid 43675725)
15. E. Marquez, J. M. Gonzaalez-Leal, R. Prieto-Alcon, R. Jimenea-Garay, and M. Vlcek, On the photo-and thermally-induced darkening phenomena in As40S40Se20 amorphous chalcogenide thin films. J. Phys. D: Appl. Phys. 32, 3128-3134 (1999). (Pubitemid 30530924)
16. A. K. Srivastava, S. Thota, and J. Kumar, Preparation, Microstructure and Optical Absorption Behaviour of NiO Thin Films. J. Nanosci. and Nanotechnol. 8, 4111-4115 (2008).
17. G. Pfeiffer, M. A. Paesler, and S. C. Aggrawal, Reversible photodarkening of amorphous chalcogens. J. Non-Cryst. Solids 130, 111-143 (1991).
18. A. V. Kolobov, H. Oyanagi, A. Roy, and K. Tanaka, A nonometer scale mechanism for reversible photostructural change in amorphous chalcogenides. J. Non-Cryst. Solids 232-234, 80-85 (1998). (Pubitemid 128430329)
19. J. Tauc, Amorphous and Liquid Semiconductors. Newyork: Plenum Press; 1979.
20. N. F. Mott and E. A. Davis, Electronic processes in Non-Crystalline Materials. 2nd Ed., Oxford: Clarendon Press; 1979.