Nitrogen plasma functionalization of low density polyethylene

Surface and Coatings Technology

Volumn 205, Issue 11, 2011, Pages 3356-3364

  López Santos, Carmen ^a   Yubero, Francisco ^a   Cotrino, José ^a,b   González Elipe, Agustín R ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITY OF SEVILLE   (Spain)

Author keywords

AFM; Amine groups; LDPE surface; Nitrogen plasma; Wetting

Indexed keywords

ALIPHATIC COMPOUNDS; AMMONIA; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; CHEMICAL ANALYSIS; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; ELECTRIC DISCHARGES; MIXTURES; OXYGEN; POLYETHYLENES; SURFACE TENSION; TOPOGRAPHY; WETTING; X RAY PHOTOELECTRON SPECTROSCOPY;

AMINE GROUPS; DIELECTRIC BARRIER DISCHARGES; LDPE SURFACE; LOW DENSITY POLYETHYLENE(LDPE); NITROGEN FUNCTIONAL GROUPS; NITROGEN-CONTAINING PLASMAS; PLASMA FUNCTIONALIZATION; XPS BACKGROUND ANALYSIS;

NITROGEN PLASMA;

EID: 79952765435     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.11.038     Document Type: Article

References (50)

1. M. Noeske, J. Degenhardt, S. Strudthoff, U. Lommatzch, Int. J. Adhes. Adhesives 24 (2004) 171.
2. V. Svorci{dotless}k, K. Kolarova, P. Slepicka, A. Mackova, M. Novotna, V. Hnatowicz, Polym. Degrad. Stab. 91 (2006) 1219.
3. F.P.M. Mercx, Polymer 35 (1994) 2098.
4. C. Oehr, M. Müller, B. Elkin, D. Hegemann, U. Vohrer, Surf. Coat. Technol. 116-119 (1999) 25.
5. L. Chu, W. Knoll, R. Förch, Plasma Process. Polym. 3 (2006) 498.
6. S. Tajima, K. Komvopoulos, Appl. Phys. Lett. 89 (2006) 124102.
7. K. Narushima, N. Yamashita, M. Fukuoka, N. Inagaki, Y. Isono, M.R. Islam, Jpn. J. Appl. Phys. 46 (2007) 4238.
8. J.M. Grace, L.J. Gerenser, J. Dispersion Sci. Technol. 24 (2006) 305.
9. L.J. Gerenser, J.M. Grace, G. Apai, P.M. Thompson, Surf. Interface Anal. 29 (2000) 12.
10. J.P. Badey, E. Espuche, D. Sage, B. Chabert, Y. Jugnet, C. Batier, T.M. Duc, Polymer 37 (1996) 1377.
11. G. Borcia, A. Chipre, I. Rusu, Plasma Sources Sci. Technol. 15 (2006) 849.
12. C.-A. Dai, Y.-H. Lee, A.-C. Chiu, T.-A. Tsui, K.-J. Lin, K.-L. Chen, M.-W. Liu, Polymer 47 (2006) 8583.
13. N.A. Bullet, D.P. Bullet, F.-E. Truica-Marasescu, S. Lerouge, F. Mwale, M.R. Wertheimer, Appl. Surf. Sci. 235 (2004) 395.
14. A.A. Meyer-Plath, K. Schröder, B. Finke, A. Ohl, Vacuum 71 (2003) 391.
15. A.A. Meyer-Plath, B. Finke, K. Schröder, A. Ohl, Surf. Coat. Technol. 174-175 (2003) 877.
16. H. Drnovska, L. Lapci{dotless}k Jr., V. Bursi{dotless}kova, J. Zemek, A.M. Barros-Timmons, Colloid Polym. Sci. 281 (2003) 1025.
17. F. Bretagnol, M. Tatoulian, F. Arefi-Khonsari, G. Lorang, J. Amouroux, React. Funct. Polym. 61 (2004) 221.
18. M. Kral, A. Ogino, M. Nagatsu, J. Phys. D Appl. Phys. 41 (2008) 105213.
19. R. Morent, N. De Geyter, L. Gengembre, C. Leys, E. Payen, S. Van Vlierberghe, E. Schacht, Eur. Phys. J. Appl. Phys. 43 (2008) 289.
20. R. Li, J.R. Chen, J. Plasma Sci. Technol. 8 (2006) 325.
21. C. Lopez-Santos, F. Yubero, J. Cotrino, A.R. Gonzalez-Elipe, ACS Appl. Mater. Interfaces 2 (2010) 980.
22. C. Lopez-Santos, F. Yubero, J. Cotrino, L. Contreras, A. Barranco, A.R. Gonzalez-Elipe, Plasma Process. Polym. 6 (2009) 555.
23. C.J. van Oss, Interfacial Forces in Aqueous Media, Marcel Decker, Nueva York (EEUU), 1994.
24. B. Jańczuk, M.L. Kerkeb, T. Bialopiotrowicz, F. González-Caballero, J. Colloid Interface Sci. 151 (1992) 333.
25. S. Tougaard, J. Vac. Sci. Technol. A 14 (1996) 1415.
26. S. Tougaard, Surf. Interface Anal. 26 (1998) 249.
27. C. López-Santos, F. Yubero, J. Cotrino, A. Barranco, A.R. González-Elipe, J. Phys. D Appl. Phys. 41 (2008) 225209.
28. M. Moisan, Z. Zakrzewski, R. Pantel, J. Phys. D Appl. Phys. 12 (1979) 219.
29. Y.A. Lebedev, I.L. Epstein, A.V. Tatarinov, V.A. Shakhatov, J. Phys. Conf. Ser. 44 (2006) 30.
30. J.H. Kim, Y.H. Choi, Y.S. Hwang, Phys. Plasma 13 (2006) 093501.
31. G. Beason, D. Briggs, High Resolution XPS of Organic Polymers, The Scienta ESCA 300 Database, Wiley and Sons, New York, 1992.
32. P. Chevallier, M. Castonguay, S. Turgeon, N. Dubrulle, D. Mantovani, P.H. McBreen, J.-C. Wittmann, G. Laroche, J. Phys. Chem. B 105 (2001) 12490.
33. A. Choukourov, H. Biederman, I. Kholodkov, D. Slavinska, M. Trchova, A. Hollander, J. Appl. Polym. Sci. 92 (2004) 979.
34. T.K. Markkula, J.A. Hunt, F.R. Pu, R.L. Williams, Surf. Interface Anal. 34 (2002) 583.
35. P. Favia, M.V. Stendardo, R. d'Agostino, Plasmas Polym. 1 (1996) 91.
36. S. Tougaard, QUASES, Software package for quantitative XPS/AES of surface nanostructures by inelastic peak shape analysis; see www.QUASES.com.
37. D.K. Owens, R.C. Wendt, J. Appl. Polym. Sci. 13 (1969) 1714.
38. V. Kotal, V. Svorcik, P. Slepicka, P. Sajdl, O. Blahova, P. Sutta, V. Hnatowicz, Plasma Process. Polym. 4 (2007) 69.
39. J. Grimblot, B. Mutel, V. Moineau, T. Colson, O. Dessaux, P. Goudmand, Surf. Interface Anal. 30 (2000) 415.
40. J. Larrieu, F. Clément, B. Held, N. Soulem, F. Luthon, C. Guimon, H. Martinez, Surf. Interface Anal. 37 (2005) 544.
41. A. Vesel, I. Junkar, U. Cvelbar, J. Kovac, M. Mozetic, Surf. Interface Anal. 40 (2008) 1444.
42. K. Narushima, N. Yamashita, Y. Isono, M.R. Islam, M. Takeuchi, Jpn. J. Appl. Phys. 47 (2008) 3603.
43. F. Truica-Marasescu, S. Guimond, M.R. Wertheimer, Nucl. Instrum. Meth. Phys. Res. B 208 (2003) 294.
44. R.W. Paynter, Surf. Interface Anal. 26 (1998) 674.
45. M. Strobel, V. Jones, Ch.S. Lyons, M. Ulsh, M.J. Kushner, R. Dorai, M. Branch, Plasmas Polym. 8 (2003) 61.
46. A.N. Bhoj, M.J. Kushner, J. Phys. D Appl. Phys. 40 (2007) 6953.
47. A.N. Bhoj, M.J. Kushner, J. Phys. D Appl. Phys. 39 (2006) 1594.
48. A.N. Bhoj, M.J. Kushner, Plasma Sources Sci. Technol. 17 (2008) 035025.
49. C.P. Klages, A. Grishin, Plasma Process. Polym. 5 (2008) 368.
50. P.-L. Girard-Lauriault, P. Desjardins, W.E.S. Unger, A. Lippitz, M.R. Wertheimer, Plasma Process. Polym. 5 (7) (2008) 631.