Perpendicular Magnetic Anisotropy in FePt Patterned Media Employing a CrV Seed Layer

Nanoscale Research Letters

Volumn 6, Issue 1, 2011, Pages 1-6

  Kim, Hyunsu ^a   Noh, Jin Seo ^a   Roh, Jong Wook ^a   Chun, Dong Won ^b   Kim, Sungman ^b   Jung, Sang Hyun ^c   Kang, Ho Kwan ^c   Jeong, Won Yong ^b   Lee, Wooyoung ^a  

^a Yonsei University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Korea Advanced Nano Fab Center (KANC)   (South Korea)

Author keywords

CrV underlayer; E beam lithography; FePt; Patterned media

Indexed keywords

ANNEALING; BINARY ALLOYS; CHROMIUM ALLOYS; CHROMIUM COMPOUNDS; COERCIVE FORCE; ION BOMBARDMENT; IRON ALLOYS; MAGNETIC ANISOTROPY; SATURATION MAGNETIZATION; VANADIUM ALLOYS; NANOIMPRINT LITHOGRAPHY; PLASMA DEPOSITION;

E-BEAM LITHOGRAPHY; FEPT; HIGH PERPENDICULAR ANISOTROPY; OUT-OF-PLANE COERCIVITY; OUT-OF-PLANE DIRECTION; PATTERNED MEDIAS; PERPENDICULAR MAGNETIC ANISOTROPY; UNDERLAYERS; AR PLASMAS; FEPT FILMS; HIGH COERCIVITY; HIGH MAGNETIZATION; IN-PLANE; MAGNETIC RECORDING MEDIA; NANO-COLUMNS; PATTERNED MEDIUM; POST ANNEALING; REMANENT MAGNETIZATION; ROOM TEMPERATURE; SEED LAYER; TOP-DOWN APPROACH;

PLATINUM ALLOYS; SATURATION MAGNETIZATION;

EID: 79952696076     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1007/s11671-010-9755-2     Document Type: Article

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