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Volumn 8, Issue 3, 2011, Pages 835-838
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Carrier mobilities in multicrystalline silicon wafers made from UMG-Si
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Author keywords
Carrier mobilities; Compensation; Silicon
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Indexed keywords
CARRIER DIFFUSIONS;
COMPENSATION;
COMPENSATION LEVEL;
ELECTROCHEMICAL CAPACITANCE VOLTAGE;
ELECTRON CONCENTRATION;
EXPERIMENTAL DATA;
IONIZED IMPURITIES;
MINORITY-CARRIER MOBILITY;
MULTICRYSTALLINE SILICON (MC-SI);
MULTICRYSTALLINE SILICON WAFERS;
N TYPE SILICON;
N-TYPE MATERIALS;
P-TYPE;
SCATTERING CENTERS;
TRANSITION REGIONS;
BORON;
BORON COMPOUNDS;
HOLE CONCENTRATION;
IONIZATION;
PHOSPHORUS;
POLYSILICON;
REDUCTION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
CARRIER MOBILITY;
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EID: 79952666469
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.201000144 Document Type: Article |
Times cited : (27)
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References (8)
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