Optical beam enhanced defect detection with electron beam inspection tools

IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings

Volumn , Issue , 2008, Pages 258-260

  Zhao, Yan ^a   Ma, Long ^a   Wang, Fei ^a   Hsiao, Jessica ^a   Xiao, Hong ^a   Jau, Jack ^a  

^a Hermes Microvision Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT DETECTION; DEFECT DETECTION SENSITIVITY; ELECTRON BEAM INSPECTIONS; GATE OXIDE; NMOS DEVICES; OPTICAL BEAMS; OPTICAL LIGHT; THIN GATE OXIDES; VOLTAGE CONTRAST;

DEFECTS; ELECTRON BEAMS; GATES (TRANSISTOR); INSPECTION EQUIPMENT; MACHINE TOOLS; MANUFACTURE; MOS DEVICES; SEMICONDUCTOR DEVICE MANUFACTURE; VOLTAGE MEASUREMENT;

INSPECTION;

EID: 79952568400     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. H. Liu, et.al., "High-resistance W-plug monitoring with an advance e-beam inspection system" Proc. of SPIE, Vol. 6162, 61524A, 2006.
2. S. Lei, et. al., "Contact leakage and open monitoring with an advanced e-beam inspection system", Proc. of SPIE, Vol. 6518, 65184I, 2007.
3. P. S. Lee, "Defect type identification using hyperextraction field", US Pat No. 6720779B1, Apr. 13, 2004
4. Larry D. Flesner, "Scanning electron microscope by photovoltage contrast imaging" US Pat. No. 4902967, Fed.20 1990