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Volumn 194-196, Issue , 2011, Pages 2254-2258

Fabrication of Ti-doped ZnO thin films by chemical bath deposition

Author keywords

Chemical bath deposition; Ti doped ZnO thin film

Indexed keywords

CHEMICAL-BATH DEPOSITION; DOPED ZNO; STRUCTURAL AND ELECTRICAL PROPERTIES; THERMAL TREATMENT; TREATMENT TEMPERATURE; WURTZITE STRUCTURE; XRD;

EID: 79952563663     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.194-196.2254     Document Type: Conference Paper
Times cited : (3)

References (16)
  • 1
    • 0002915590 scopus 로고
    • G. Hass, M.H. Francombe and R.W. Hoffmann (eds.), Academic Press, New York
    • J.L. Vossen, in G. Hass, M.H. Francombe and R.W. Hoffmann (eds.), Physics of Thin Films, Academic Press, New York, (1977), p. 1.
    • (1977) Physics of Thin Films , pp. 1
    • Vossen, J.L.1
  • 4
    • 0003548707 scopus 로고
    • R.B. Pamplin (Ed.), Pergamon Press, Oxford
    • Z.M. Jarzebzki, in: R.B. Pamplin (Ed.), Oxide Semiconductors, Pergamon Press, Oxford (1973), p. 239.
    • (1973) Oxide Semiconductors , pp. 239
    • Jarzebzki, Z.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.