Effects of negative bias pulse on characteristics of a-C:H films prepared by plasma-based ion implantation

Materials Science Forum

Volumn 675 677, Issue , 2011, Pages 1279-1282

  Wang, Yu Jiang ^a,b   Ma, Xin Xin ^a   Tang, Guang Ze ^a   Sun, Ming Ren ^a   Xu, Bin Shi ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b NATIONAL KEY LABORATORY FOR REMANUFACTURING   (China)

Author keywords

DLC; PBII; Raman spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

CARBON FILMS; DIAMOND LIKE CARBON FILMS; FILM PREPARATION; ION IMPLANTATION; PHOTOELECTRONS; PHOTONS; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

A-C:H FILMS; MICRO-INDENTATION TESTS; MINIMUM VALUE; NEGATIVE BIAS; PBII; PEAK INTENSITY RATIO; PLASMA-BASED ION IMPLANTATION; SURFACE HARDNESS;

POLYMER FILMS;

EID: 79952546099     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.675-677.1279     Document Type: Conference Paper

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