Influence of the processing conditions on the structural properties of ZnO layers obtained by PECVD

Journal of Physics: Conference Series

Volumn 253, Issue 1, 2010, Pages

  Kitova, S ^a   Danev, G ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLITE SIZE; CRYSTALLITES; DEPOSITION; FILM GROWTH; GAS MIXTURES; GASES; GRAIN GROWTH; MOLECULAR ELECTRONICS; NANORODS; ORGANOMETALLICS; OXYGEN; PLASMA CVD; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STRUCTURAL PROPERTIES; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

ENHANCED SENSITIVITY; HEXAGONAL WURTZITE STRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS (PE CVD); POTENTIAL MATERIALS; PROCESSING CONDITION; STRUCTURAL CHARACTERISTICS; STRUCTURED MATERIALS; SUBSTRATE TEMPERATURE;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 79952392508     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/253/1/012031     Document Type: Conference Paper

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