Understanding crystallization of anatase into binary SiO 2/TiO2 sol-gel optical thin films: An in situ thermal ellipsometry analysis

Journal of Physical Chemistry C

Volumn 115, Issue 7, 2011, Pages 3115-3122

  Louis, Benjamin ^a,b   Krins, Natacha ^a   Faustini, Marco ^a   Grosso, David ^a  

^a UNIVERSITÉ PIERRE ET MARIE CURIE   (France)

^b Institut Pierre Vernier   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE NANOPARTICLES; ATOMIC DIFFUSIONS; ATOMIC PROPORTION; BINARY OXIDE SYSTEMS; BINARY OXIDES; CRYSTAL SIZE; CRYSTALLIZATION TEMPERATURE; DIP COATING; ELECTRONIC MICROSCOPY; HIGH-T; IN-SITU; MOLAR COMPOSITIONS; OPTICAL THIN FILMS; SEMI-CONDUCTING PROPERTY; SILICA CONTENT; SILICA NETWORKS; SOL GEL SOLUTIONS; STRUCTURED FILMS; SURFACE TOPOLOGY; TETRA-ETHYL-ORTHO-SILICATE; THERMAL TREATMENT; TIO; TITANIA; TITANIA NANOPARTICLES; TREATMENT CONDITIONS; ULTRA-THIN; VISCOUS SINTERING;

AMORPHOUS FILMS; CONDENSATION; CRYSTALLIZATION KINETICS; ELLIPSOMETRY; GELS; GRAIN SIZE AND SHAPE; HEATING; HEATING RATE; NANOPARTICLES; OXIDE FILMS; PROTECTIVE COATINGS; REFRACTIVE INDEX; SILICA; SINTERING; SOL-GEL PROCESS; SOL-GELS; SOLS; TITANIUM DIOXIDE;

OPTICAL FILMS;

EID: 79951903629     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp109653p     Document Type: Article

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