Interaction mechanism of femtosecond laser and wide band-gap material

Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering

Volumn 39, Issue 6, 2010, Pages 1044-1048

  Jiang, Tao ^a   Zhao, Qing Liang ^a   Dong, Zhi Wei ^a   Fan, Rong Wei ^a   Yu, Xin ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Ablation threshold; Femtosecond laser; Material ablation mechanisms; SiC

Indexed keywords

ABLATION PROCESS; ABLATION THRESHOLDS; ANALYTICAL TECHNOLOGY; DAMAGED REGION; ELECTRO MICROSCOPY; FEMTOSECOND LASER; HARD MATERIAL; INCIDENT LASER; INTERACTION MECHANISMS; KEY PARAMETERS; MATERIAL ABLATION; MATERIAL ABLATION MECHANISMS; MICRO TOPOGRAPHY; NEAR INFRARED; PROCESSING PARAMETERS; SEM; SIC; WIDE BAND GAP; WIDE BAND-GAP MATERIAL;

ABLATION; MATERIALS; OPTICAL MICROSCOPY; SILICON CARBIDE; ULTRASHORT PULSES;

INFRARED LASERS;

EID: 79951800000     PISSN: 10072276     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

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