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Volumn 8, Issue 2, 2011, Pages 540-542
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Growth of SnO2 crystalline thin films by mist chemical vapour deposition method
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Author keywords
Electrical properties; Growth technology; Single crystal; Tin oxide
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Indexed keywords
CARRIER GAS;
CHEMICAL VAPOUR DEPOSITION;
COMPOUND SEMICONDUCTORS;
CRYSTALLINE THIN FILMS;
ELECTRICAL PROPERTY;
ENVIRONMENTAL-FRIENDLY TECHNOLOGY;
GROWTH TECHNOLOGY;
HIGH QUALITY;
MIST CVD;
SAPPHIRE SUBSTRATES;
SINGLE-CRYSTALLINE;
SINGLE-CRYSTALLINE FILM;
WATER SOLUTIONS;
CARRIER CONCENTRATION;
CARRIER MOBILITY;
CRYSTALLINE MATERIALS;
DEPOSITION;
ELECTRIC PROPERTIES;
MOLECULAR BEAM EPITAXY;
MOLECULAR BEAMS;
SEMICONDUCTOR DEVICE MANUFACTURE;
SEMICONDUCTOR GROWTH;
SINGLE CRYSTALS;
TECHNOLOGY;
THIN FILMS;
TIN;
TIN OXIDES;
CHEMICAL VAPOR DEPOSITION;
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EID: 79951711418
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.201000619 Document Type: Article |
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Times cited : (54)
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References (11)
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