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Volumn 11, Issue 3, 2011, Pages 827-829
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Oxygen-passivated enhancement of photoluminescence from SiO2 films containing Si nanocrystals
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Author keywords
Oxygen passivation; Photoluminescence; Si nanocrystal
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Indexed keywords
ATOMIC OXYGEN;
DEFECT PASSIVATION;
DEPASSIVATION;
EXPOSURE TEMPERATURE;
EXPOSURE-TIME;
OXYGEN PASSIVATION;
PHOTOLUMINESCENCE INTENSITIES;
PL SPECTRA;
SI NANOCRYSTAL;
THERMAL-ANNEALING;
ACTIVATION ENERGY;
NANOCRYSTALS;
OXYGEN;
PHOTOLUMINESCENCE;
SILICON;
SILICON COMPOUNDS;
PASSIVATION;
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EID: 79951683350
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2010.11.112 Document Type: Article |
Times cited : (5)
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References (21)
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