![]() |
Volumn 104, Issue 8, 2008, Pages
|
Photoluminescence from Si nanocrystals exposed to a hydrogen plasma
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ACTIVATION ENERGY;
HYDROGEN;
LIGHT EMISSION;
LUMINESCENCE;
NANOCRYSTALLINE ALLOYS;
NANOCRYSTALS;
NANOSTRUCTURED MATERIALS;
NANOSTRUCTURES;
PHOTOLUMINESCENCE;
PLASMAS;
SILICON;
DEFECT PASSIVATIONS;
DEPASSIVATION;
EXPOSURE TEMPERATURES;
EXPOSURE TIMES;
HYDROGEN PLASMAS;
PHOTOLUMINESCENCE INTENSITIES;
SATURATION LEVELS;
SI NANOCRYSTALS;
SIO2 FILMS;
PASSIVATION;
|
EID: 55249126186
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3002913 Document Type: Article |
Times cited : (18)
|
References (15)
|