Ultra-low-loss high-aspect-ratio Si3N4 waveguides

Optics Express

Volumn 19, Issue 4, 2011, Pages 3163-3174

  Bauters, Jared F ^a   Heck, Martijn J R ^a   John, Demis ^a   Dai, Daoxin ^a   Tien, Ming Chun ^a   Barton, Jonathon S ^a   Leinse, Arne ^b   Heideman, René G ^b   Blumenthal, Daniel J ^a   Bowers, John E ^a  

^a University of California   (United States)

^b LIONIX BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; WAVEGUIDES;

HIGH ASPECT RATIO; LOW LOSS; LOW-LOSS WAVEGUIDES; OPTICAL FREQUENCY DOMAIN REFLECTOMETRY TECHNIQUES; RING RESONATOR; TOTAL PROPAGATION LOSS; WAVEGUIDE LOSS;

ASPECT RATIO;

EID: 79951615384     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.003163     Document Type: Article

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