Novel method for producing high H2 permeability Pd membranes with a thin layer of the sulfur tolerant Pd/Cu fcc phase

Journal of Membrane Science

Volumn 370, Issue 1-2, 2011, Pages 97-108

  Pomerantz, Natalie ^a   Ma, Yi Hua ^a  

^a Worcester Polytechnic Institute   (United States)

Author keywords

Electroless plating; Galvanic displacement deposition; Hydrogen separation; Pd Cu alloy membranes; Sulfur tolerance

Indexed keywords

ATOMIC ABSORPTION SPECTROSCOPY; BATH AGITATION; DIFFUSIONAL MASS TRANSFER; FCC ALLOYS; FCC PHASE; GALVANIC DISPLACEMENT; HIGH DEPOSITION RATES; HYDROGEN PERMEANCE; HYDROGEN SEPARATION; MEMBRANE THICKNESS; NOVEL METHODS; PD MEMBRANE; PD/CU ALLOY MEMBRANES; SUBMICRON; SULFUR TOLERANCE; THIN LAYERS; XRD STUDIES;

ABSORPTION SPECTROSCOPY; ALLOYS; ATOMIC SPECTROSCOPY; ELECTROLESS PLATING; HYDROGEN; PALLADIUM; SULFUR; THIN FILMS;

MEMBRANES;

ALLOY; COPPER; HYDROGEN; PALLADIUM; SULFUR;

ARTICLE; ATOMIC ABSORPTION SPECTROMETRY; GALVANIC CURRENT; KINETICS; MEMBRANE; PERMEABILITY; PLATING MEDIUM; PRIORITY JOURNAL;

EID: 79951554554     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.memsci.2010.12.045     Document Type: Article

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