Attosecond dispersion control by extreme ultraviolet multilayer mirrors

Optics Express

Volumn 19, Issue 3, 2011, Pages 1767-1776

  Hofstetter, Michael ^a,b   Schultze, Martin ^a,b   Fieß, Markus ^b   Dennhardt, Benjamin ^b,c   Guggenmos, Alexander ^a,b   Gagnon, Justin ^a,b   Yakovlev, Vladislav S ^a,b   Goulielmakis, Eleftherios ^b   Kienberger, Reinhard ^b,c   Gullikson, Eric M ^d   Ferenc, Krausz ^a,b   Kleineberg, Ulf ^a,b  

^a UNIVERSITY OF MUNICH   (Germany)

^b MAX PLANCK INSTITUT FÜR QUANTENOPTIK   (Germany)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^d LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSIONS; MIRRORS; MULTILAYERS;

ATTOSECOND METROLOGY; ATTOSECOND PULSE; DISPERSION CONTROL; EXPERIMENTAL DEMONSTRATIONS; EXTREME ULTRAVIOLET MULTILAYERS; FREQUENCY SWEEP; PERIODIC MULTILAYERS; PHOTON ENERGY RANGE;

PHOTONS;

ARTICLE; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; OPTICAL INSTRUMENTATION; REFRACTOMETRY; ULTRAVIOLET RADIATION;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LENSES; REFRACTOMETRY; ULTRAVIOLET RAYS;

EID: 79851487977     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.001767     Document Type: Article

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