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Volumn 47, Issue 3, 2011, Pages 212-214

RF performance of InAlN/AlN/GaN HEMTs on sapphire substrate

Author keywords

[No Author keywords available]

Indexed keywords

BARRIER LAYER THICKNESS; CURRENT GAIN CUTOFF FREQUENCY; GATE LENGTH; PEAK EXTRINSIC TRANSCONDUCTANCE; POWER GAIN CUTOFF FREQUENCIES; RF PERFORMANCE; SAPPHIRE SUBSTRATES;

EID: 79551703899     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el.2010.7512     Document Type: Article
Times cited : (12)

References (5)
  • 2
    • 34547193872 scopus 로고    scopus 로고
    • 30-nm-Gate AlGaN/GaN heterostructure field-effect transistors with a current-gain cutoff frequency of 181 GHz
    • DOI 10.1143/JJAP.45.L1111
    • Higashiwaki, M., Mimura, T., and Matsui, T.: ' 30-nm-gate AlGaN/GaN heterostructure field-effect transistors with a current-gain cutoff frequency of 181GHz ', Jpn. J. Appl. Phys, 2006, 45, (42), p. L1111-L1113 10.1143/JJAP.45.L1111 0021-4922 (Pubitemid 47434506)
    • (2006) Japanese Journal of Applied Physics, Part 2: Letters , vol.45 , Issue.42-45
    • Higashiwaki, M.1    Mimura, T.2    Matsui, T.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.