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Volumn 49, Issue 11, 2010, Pages
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New radiophotoluminescence glass dosimeter with specialized radiation-sensitive surface layer
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING PROCESS;
DIFFUSION COEFFICIENTS;
EXCITATION LASERS;
FLUORESCENCE MICROSCOPES;
MELTING METHOD;
PHOSPHATE GLASS;
RADIOPHOTOLUMINESCENCE GLASS DOSIMETERS;
SURFACE LAYERS;
ACTIVATION ENERGY;
ATOMS;
DIFFUSION;
DOSIMETERS;
GLASS;
LASER EXCITATION;
SILVER;
THERMAL DIFFUSION IN LIQUIDS;
DOSIMETRY;
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EID: 79551642158
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.49.116401 Document Type: Article |
Times cited : (3)
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References (16)
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