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Journal of the Electrochemical Society

Volumn 158, Issue 3, 2011, Pages

Rinsing effects on successive ionic layer adsorption and reaction method for deposition of ZnO thin films

(3) Shei, Shih Chang a Chang, Shoou Jinn b Lee, Pay Yu a

a NATIONAL UNIVERSITY OF TAINAN (Taiwan)

b NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DISPERSING AGENT; FINER GRAINS; MECHANISM ANALYSIS; RINSING PROCESS; SILAR METHOD; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS; ULTRASONIC IRRADIATION; VISIBLE-LIGHT WAVELENGTHS; ZNO; ZNO FILMS; ZNO THIN FILM;

ADSORPTION; AGGLOMERATION; DEIONIZED WATER; DEPOSITION; ETHYLENE; ETHYLENE GLYCOL; METALLIC FILMS; OPTICAL FILMS; OXYGEN; OXYGEN VACANCIES; THIN FILMS; TRANSPARENCY; ULTRASONICS; VAPOR DEPOSITION; ZINC;

ZINC OXIDE;

EID: 79551607590 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3528306 Document Type: Article

Times cited : (24)

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