Comparison of ZnO thin films deposited by three different SILAR processes

Microelectronics Journal

Volumn 39, Issue 11, 2008, Pages 1349-1350

  Vargas Hernandez C ^a   Jimenez Garcia F N ^a,b   Jurado, J F ^a   Henao Granada, V ^a  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^b UNIVERSIDAD AUTÓNOMA DE MANIZALES   (Colombia)

Author keywords

Optical absorption; Raman; SILAR; Zinc oxide films

Indexed keywords

ABSORPTION; ADSORPTION; AMMONIUM COMPOUNDS; AMORPHOUS FILMS; ELECTROMAGNETIC WAVE ABSORPTION; ENERGY ABSORPTION; LIGHT ABSORPTION; METALLIC FILMS; OPTICAL FILMS; SEMICONDUCTING ZINC COMPOUNDS; THICK FILMS; THIN FILMS; X RAY ANALYSIS; ZINC; ZINC ALLOYS; ZINC OXIDE;

AMORPHOUS GLASSES; BAND GAPS; COMPLEX AGENTS; OPTICAL ABSORPTION; OPTICAL ABSORPTIONS; RAMAN; SILAR; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS; VIBRATION MODES; X-RAY DIFFRACTIONS; ZINC OXIDE FILMS; ZNO THIN FILMS;

OXIDE FILMS;

EID: 54849433422     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2008.01.056     Document Type: Article

References (7)

1. Keis K., Mognusson E., Lindstorm H., Lindquist S.E., and Hagfeldt A. Sol. Energy 73 (2002) 51
2. Ristov M., Sinadinovski G.J., Grozdanov I., and Mitreski M. Thin Solid Films 149 (1987) 65
3. Mitra P., and Khan J. Mater. Chem. Phys. 98 (2006) 279
4. Gao X.D., Li X.M., and Yu W.D. J. Solid State Chem. 177 (2004) 3830
5. Damen T.C., Porto S.P.S., and Tell B. Phys. Rev. 142 (1966) 570
6. Calleja J.M., and Cardona M. Phys. Rev. B 16 (1997) 3753
7. Wang R.P., Xu G., and Jin P. Phys. Rev. B 69 (2004) 113303