Improving nanoimprint lithography stamps for the 10 nm features

Proceedings of the IEEE Conference on Nanotechnology

Volumn 2001-January, Issue , 2001, Pages 17-22

  Beck, M ^a   Graczyk, M ^a   Maximov, I ^a   Sarwe, E L ^a   Ling, T G I ^a   Montelius, L ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; DEPOSITION; NANOTECHNOLOGY; SILANES;

ANTIADHESION; FLUORINATED SILANES; MOLECULAR LAYER; POLYMER LAYERS; SIZE RANGES; SMALL AREA; SURFACE AREA;

NANOIMPRINT LITHOGRAPHY;

EID: 79551594443     PISSN: 19449399     EISSN: 19449380     Source Type: Conference Proceeding    
DOI: 10.1109/NANO.2001.966385     Document Type: Conference Paper

References (11)

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3. B. Heidari, L. Montelius, I. Maximov: Nanoimprint lithography at the 6-inch wafer scale, Journal of Vacuum Science & Technology B, 18(6), (2000), pp. 3557-3560.
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7. S. Chou: Surfaces with Release Agent, World Patent, 00/00868, (2000).
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10. MaxLab is the Swedish National Laboratory for Synchrotron Radiation situated in Lund.
11. More detailed XPS-spectroscopic investigations are currently performed, latest results will be presented on the IEEE-Nano conference on Maui.