Temperature impact on morphological evolution of ZnO and its consequent effect on physico-chemical properties

Journal of Alloys and Compounds

Volumn 509, Issue 8, 2011, Pages 3486-3492

  Kulkarni, S B ^a,b   Patil, U M ^a   Salunkhe, R R ^a   Joshi, S S ^b   Lokhande, C D ^a  

^a SHIVAJI UNIVERSITY   (India)

^b RAJARAM COLLEGE   (India)

Author keywords

EDTA chelant; Morphology; Nanocrystalline ZnO; Physico chemical properties; Temperature effect

Indexed keywords

ALKALINE ENVIRONMENT; BATH TEMPERATURES; CHELANTS; DEPOSITION TEMPERATURES; ELECTRIC RESISTIVITY; ELECTRICAL RESISTIVITY; FUNCTIONAL APPLICATIONS; GLASS SUBSTRATES; GROWTH MECHANISMS; HEXAGONAL STRUCTURES; MORPHOLOGICAL EVOLUTION; MORPHOLOGY EVOLUTION; NANOCRYSTALLINE ZNO; OPTICAL AND ELECTRICAL PROPERTIES; PHYSICO-CHEMICAL PROPERTIES; PHYSICOCHEMICAL PROPERTY; ROOM TEMPERATURE; ROOM TEMPERATURE PHOTOLUMINESCENCE SPECTRA; SUPER-HYDROPHILIC; TEMPERATURE DEPENDENT; TEMPERATURE EFFECT; TEMPERATURE IMPACT; VISIBLE LIGHT REGION; WETTABILLITY; ZNO; ZNO THIN FILM;

CHEMICAL PROPERTIES; ELECTRIC CONDUCTIVITY; GOLD DEPOSITS; METAL ANALYSIS; METALLIC FILMS; MORPHOLOGY; OPTICAL FILMS; SUBSTRATES; TEMPERATURE; THIN FILMS; VAPOR DEPOSITION;

ZINC OXIDE;

EID: 79551494233     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.12.036     Document Type: Article

References (52)

1. R. Baron, F.W. Campbell, I. Streeter, L. Xiao, and R.G. Compton Int. J. Electrochem. Sci. 3 2008 556
2. A.B. Moghaddam, M. Kazemzad, M.R. Nabid, and H.H. Dabaghi Int. J. Electrochem. Sci. 3 2008 291
3. D.J. Milliron, S.M. Hughes, Y. Cui, L. Manna, J. Li, L.W. Wang, and A.P. Alivisatos Nature 430 2004 190
4. S.M. Lukas, L. Judith, and D. MacManus Mater. Today 10 2007 40
5. N. Tamaki, A. Onodera, T. Sawada, and H. Yamashita J. Kor. Phys. Soc. 29 1996 S668
6. S.B. Zhang, S.H. Wei, and A. Zunger Phys. Rev. B 63 2001 075205
7. H.S. Kang, J.S. Kang, J.W. Kim, and S.Y. Lee J. Appl. Phys. 95 2004 1246
8. V.R. Shinde, T.P. Gujar, C.D. Lokhande, R.S. Mane, and S.H. Han Mater. Sci. Eng. B 137 2007 119
9. X.D. Gao, and X.M. Li J. Mater. Res. 22 2007 1815
10. L. Vayssieres, K. Keis, A. Hagfeldt, and S.E. Lindquist Chem. Mater. 13 2001 4395
11. Z.L. Wang Mater. Today 7 2004 26
12. J.H. Park, H.J. Choi, Y.J. Choi, S.H. Sohn, and J.G. Park J. Mater. Chem. 14 2004 35
13. J.H. Park, H.J. Choi, and J.G. Park J. Cryst. Growth 263 2004 237
14. W.I. Park, D.H. Kim, S.W. Jung, and G.C. Yi Appl. Phys. Lett. 80 2002 4232
15. W.I. Park, G.C. Yi, M.Y. Kim, and S.J. Pennycook Adv. Mater. 14 2002 1841
16. Y.W. Wang, L.D. Zhang, G.Z. Wang, X.S. Peng, Z.Q. Chu, and C.H. Liang J. Cryst. Growth 234 2002 171
17. P.D. Yang, H.Q. Yan, S. Mao, R. Russo, J. Johnson, R. Saykally, N. Morris, J. Pham, R.R. He, and H.J. Choi Adv. Funct. Mater. 12 2002 323
18. S.Y. Li, C.Y. Lee, and T.Y. Tseng J. Cryst. Growth 247 2003 357
19. Y. Ding, P.X. Gao, and Z.L. Wang J. Am. Chem. Soc. 126 2004 2066
20. M.H. Huang, Y.Y. Wu, H. Feick, N. Tran, E. Weber, and P.D. Yang Adv. Mater. 13 2001 113
21. Y. Sun, G.M. Fuge, and M.N.R. Ashfold Chem. Phys. Lett. 396 2004 21
22. Y. Li, G.W. Meng, L.D. Zhang, and F. Phillipp Appl. Phys. Lett. 76 2000 2011
23. V.R. shinde, T.P. Gujar, and C.D. Lokhande Sens. Actuators B 120 2007 551
24. A.I. Inamdar, S.H. Mujawar, S.R. Barman, P.N. Bhosale, and P.S. Patil Semicond. Sci. Technol. 23 2008 085013
25. L. Wuand, and Y. Wu J. Mater. Sci. 42 2007 406
26. S. Nizam, A. Rahman, A. Shafii, A.F.M. Nor, and B. Kamaluddir J. Solid State Sci. Technol. Lett. 9 2002 354
27. K. Kakiuchi, E. Hosono, T. Kimura, H. Imai, and S. Fujihara J. Sol Gel Sci. Technol. 39 2006 63
28. K.J. Westin, and A.C. Rasmuson J. Colloid. Interface Sci. 282 2005 370
29. K.J. Westin, and A.C. Rasmuson J. Colloid. Interface Sci. 282 2005 359
30. D. Williams Chem. Br. 1 1998 48
31. M. Izaki J. Elctrochem. Soc. 146 1999 4517
32. X.S. Wang, Z.C. Wu, J.F. Webb, and Z.G. Liu Appl. Phys. A 77 2003 561
33. K. Ramamoorthy, M. Arivanandhan, K. Sankarnarayanan, and C. Sanjeevaraja Mater. Chem. Phys. 85 2004 257
34. C.S. Barrett, and T.B. Massalski Structure of Metals 1980 Pergamon Press Oxford p. 204 (Chapter 9)
35. A.A. Ramadan, A.A. E-Mongy, A.M. E-Shabiny, A.T. Mater, S.H. Mostafa, E.A. E-Sheheedy, and H.M. Hashem Cryst. Res. Technol. 44 2009 111
36. S.J. Jun, S. Kim, and J.H. Han J. Kor. Ceram. Soc. 35 1998 209
37. A.C. Tas, P.J. Majewski, and F. Aldinger J. Am. Ceram. Soc. 83 2000 2954
38. H.C. Choi, Y.M. Jung, and S.B. Kim Vib. Spectrosc. 37 2005 33
39. S.M. Pawar, K.V. Gurav, S.W. Shin, D.S. Choi, I.K. Kim, C.D. Lokhande, J.I. Rhee, and J.H. Kim J. Nanosci. Nanotechnol. 10 2010 3412
40. R.D. Sun, A. Nakajima, A. Fujishima, T. Watanabe, and K. Hashimoto J. Phys. Chem. B 105 2001 1984
41. T. Dedova, J. Klauson, C. Badre, Th. Pauporté, R. Nisumaa, A. Mere, O. Volobujeva, and M. Krunks Phys. Status Solidi 205 2008 2355
42. B. Bhushan, K. Koch, and Y.C. Jung Appl. Phys. Lett. 93 2008 093101
43. A.B.D. Cassie, and S. Baxter Trans. Faraday Soc. 40 1944 546
44. K.G. Kanade, B.B. Kale, R.C. Aiyer, and B.K. Das Mater. Res. Bull. 41 2006 590
45. S.T. Tan, B.J. Chen, X.W. Sun, W.J. Ean, H.S. Kwok, X.H. Zhang, and S.J. Chssua J. Appl. Phys. 98 2005 013505
46. K.H. Tam, C.K. Cheung, Y.H. Leung, A.B. Djurisic, C.C. Ling, C.D. Beling, S. Fung, W.M. Kwok, W.K. Chan, D.L. Phillips, L. Ding, and W.K. Ge J. Phys. Chem. B 110 2006 20865
47. A.B. Djurisic, and Y.H. Leung Small 944 2006 8
48. X.M. Fan, J.S. Lian, L. Zhao, and Y. Liu Appl. Surf. Sci. 252 2005 420
49. T. Tatsumi, M. Fujita, N. Kawamoto, M. Sasajima, and Y. Horikoshi Jpn. J. Appl. Phys. 43 2004 2602
50. Q.X. Zhao, P. Klason, M. Willander, H.M. Zhong, W. Lu, and J.H. Yang Appl. Phys. Lett. 87 2005 211912
51. A. Teke, U. Ozgur, S. Dogan, X. Gu, H. Morkoc, B. Nemeth, J. Nause, and H.O. Everitt Phys. Rev. B 70 2004 195207
52. V.R. Shinde, C.D. Lokhande, R.S. Mane, and S.H. Han Appl. Surf. Sci. 245 2005 407