Tailoring optical forces in waveguides through radiation pressure and electrostrictive forces

Optics Express

Volumn 18, Issue 14, 2010, Pages 14439-14453

  Rakich, Peter T ^a   Davids, Paul ^a   Wang, Zheng ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BRILLOUIN SCATTERING; DIELECTRIC MATERIALS; ELASTIC WAVES; NANOTECHNOLOGY; OPTICAL WAVEGUIDES; RADIATION; REFRACTIVE INDEX;

ANALYTICAL AND NUMERICAL MODELS; HIGH-INDEX CONTRAST WAVEGUIDES; NANO-SCALE PHOTONIC WAVEGUIDES; NANO-SCALE WAVEGUIDES; PHOTOELASTIC TENSORS; RADIATION PRESSURE; REFRACTIVE INDEX CHANGES; SELECTIVE EXCITATIONS;

PRESSURE;

EID: 79251495896     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.014439     Document Type: Article

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