General treatment of optical forces and potentials in mechanically variable photonic systems

Optics Express

Volumn 17, Issue 20, 2009, Pages 18116-18135

  Rakich, Peter T ^a   Popović, Miloš A ^b   Wang, Zheng ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL CONSTANTS; OPTICS;

AMPLITUDE RESPONSE; EXTERNAL LASER SOURCES; FIELD DISTRIBUTION; MAXWELL STRESS TENSOR METHOD; MECHANICAL DEGREES; OPTICAL POTENTIAL; OPTICAL RESPONSE; POTENTIAL PROFILES;

DEGREES OF FREEDOM (MECHANICS);

ARTICLE; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EQUIPMENT; EQUIPMENT DESIGN; MECHANICAL STRESS; OPTICAL INSTRUMENTATION; PRESSURE; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; THEORETICAL MODEL;

COMPUTER SIMULATION; COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MODELS, THEORETICAL; OPTICAL DEVICES; PRESSURE; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; STRESS, MECHANICAL;

EID: 70349669422     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.018116     Document Type: Article

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