Robust SERS substrates generated by coupling a bottom-up approach and atomic layer deposition

ACS Applied Materials and Interfaces

Volumn 2, Issue 7, 2010, Pages 1987-1991

  Formo, Eric V ^a   Mahurin, Shannon M ^a   Dai, Sheng ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

ALD; bottom up; nanowire; robust; SERS; silver

Indexed keywords

ALD; BOTTOM UP APPROACH; BOTTOM-UP; CATALYTIC PROCESS; COATED SAMPLE; GLASS SUBSTRATES; HIGH TEMPERATURE; HIGHER TEMPERATURES; NANOMORPHOLOGIES; POLYOL REDUCTION PROCESS; POTENTIAL APPLICATIONS; PROTECTIVE LAYERS; RAMAN SIGNAL; SERS SPECTRUM; SERS SUBSTRATE; SILVER NANOWIRES; SURFACE OXIDATIONS; THERMALLY STABLE;

AGGLOMERATION; ATOMIC LAYER DEPOSITION; HEATING; NANOWIRES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILVER;

SUBSTRATES;

EID: 79151484846     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100272h     Document Type: Article

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