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Volumn 41, Issue 1, 2010, Pages 4-11

Use of atomic layer deposition to improve the stability of silver substrates for in situ, high-temperature SERS measurements

(4) John, Joshy F a Mahurin, Shannon b Dai, Sheng b Sepaniak, Michael J a

a UNIVERSITY OF TENNESSEE (United States)

b OAK RIDGE NATIONAL LABORATORY (United States)

Author keywords

Atomic layer deposition; SERS; Stability

Indexed keywords

ALUMINUM OXIDE; ATOMS; CALCIUM COMPOUNDS; HIGH TEMPERATURE APPLICATIONS; NITRATES; RAMAN SPECTROSCOPY; SILVER; SUBSTRATES; THERMAL EVAPORATION; THERMODYNAMIC STABILITY;

ATOMIC-LAYER DEPOSITION; COATED SUBSTRATES; ELEVATED TEMPERATURE; HIGHEST TEMPERATURE; MEASUREMENTS OF; RAMAN INTENSITIES; RAMAN SPECTROSCOPY MEASUREMENTS; SILVER ISLAND FILMS; SILVER SUBSTRATE; SURFACE ENHANCED RAMAN SPECTROSCOPY;

ALUMINA;

EID: 74349118901 PISSN: 03770486 EISSN: 10974555 Source Type: Journal
DOI: 10.1002/jrs.2395 Document Type: Article

Times cited : (70)

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