MCs+ depth profiling using cluster primary ions

Surface and Interface Analysis

Volumn 43, Issue 1-2, 2011, Pages 204-206

  Niehuis, E ^a   Grehl, T ^a   Kollmer, F ^a   Moellers, R ^a   Rading, D ^a   Kersting, R ^b   Hagenhoff, B ^b  

^a UNIVERSITY OF MÜNSTER   (Germany)

^b TASCON GMBH   (Germany)

Author keywords

bismuth; C60; cluster primary ions; dual beam depth profiling; MCs depth profiling; quantitative analysis

Indexed keywords

C60; DUAL-BEAM DEPTH PROFILING; MCS DEPTH PROFILING; PRIMARY IONS; QUANTITATIVE ANALYSIS;

BISMUTH; CESIUM; CESIUM COMPOUNDS; IONIZATION POTENTIAL; IONS; SECONDARY ION MASS SPECTROMETRY;

DEPTH PROFILING;

EID: 78951480674     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3465     Document Type: Conference Paper

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