Development of structural and optical properties of WOx films upon increasing oxygen partial pressure during reactive sputtering

Physica B: Condensed Matter

Volumn 406, Issue 4, 2011, Pages 831-835

  Mohamed, S H ^a,b   Mohamed, H A ^a,c   Abd El Ghani, H A ^a  

^a Sohag University   (Egypt)

^b QASSIM UNIVERSITY   (Saudi Arabia)

^c KING SAUD UNIVERSITY   (Saudi Arabia)

Author keywords

dc sputtering; Optical properties; Structural properties; WOx films

Indexed keywords

DC SPUTTERING; OXYGEN PARTIAL PRESSURE; REACTIVE DC MAGNETRON SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; TOTAL PRESSURE; TRANSPARENT FILMS; WOX FILMS;

AMORPHOUS FILMS; ARGON; FILM PREPARATION; ORGANIC POLYMERS; OXYGEN; PARTIAL PRESSURE; POSITIVE IONS; REFRACTIVE INDEX; STRUCTURAL PROPERTIES; TUNGSTEN; X RAY DIFFRACTION;

OPTICAL FILMS;

EID: 78751648439     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2010.12.005     Document Type: Article

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