Radio-frequency assisted pulsed laser deposition of nanostructured WO x films

Applied Surface Science

Volumn 255, Issue 24, 2009, Pages 9699-9702

  Filipescu, M ^a   Ossi, P M ^b   Santo, N ^c   Dinescu, M ^a  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b POLITECNICO DI MILANO   (Italy)

^c UNIVERSITY OF MILAN   (Italy)

Author keywords

Clusters; Pulsed laser deposition; Radio frequency

Indexed keywords

ATOMIC FORCE MICROSCOPY; GAS SENSING ELECTRODES; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; OXIDE FILMS; OXYGEN; PULSED LASER DEPOSITION; RADIO WAVES; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

CLUSTERS; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; GAS SENSING APPLICATIONS; MICRO RAMAN SPECTROSCOPY; RADIO FREQUENCIES; SCANNING AND TRANSMISSION ELECTRON MICROSCOPY; TARGET TO SUBSTRATE DISTANCE;

PULSED LASERS;

EID: 70349578022     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.04.073     Document Type: Article

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