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Volumn 95, Issue 3, 2011, Pages 974-980

Sheet resistance characterization of laser-doped lines on crystalline silicon wafers for photovoltaic applications

Author keywords

Four point probe; Laser doping; Sheet resistance characterization; Solar cell; TLM

Indexed keywords

CRYSTALLINE SILICON WAFERS; FORM LINES; FOUR-POINT PROBE; LASER DOPING; MEASUREMENT TECHNIQUES; METALLIZATIONS; MULTIPLE LASERS; OVERDOPING; PHOTOVOLTAIC APPLICATIONS; PROBING PADS; RECTANGULAR AREA; SINGLE LASERS; STRUCTURE-BASED; TLM; TLM METHOD; TRANSFER LENGTH METHODS; UPPER LIMIT VALUES;

EID: 78751647542     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.12.002     Document Type: Article
Times cited : (14)

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  • 18
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    • Fast simulation code for heating, phase changes and dopant diffusion in silicon laser processing using the alternating direction explicit (ADE) method
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    • Fell, A.1    Willeke, G.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.